BioXAS-Imaging
BioXAS-Imaging

Macro-mode

Status: 🟢 Operational


The macro resolution mode is capable of rapid XRF imaging of relatively large samples. In addition, subregions of interest can be scanned with higher spatial resolution without changing the setup. A series of pinholes, which determines the beam size, are on a motorized stage and a beam size of interest (ranging between 20 to 150 μm) can be quickly selected during the same experiment. There are two stage-configuration available depending on the sample thickness. The 45 degrees stage-configuration with respect to the incident beam are generally set up for cross-sections varying from a few μm to a couple of hundreds of μm. For thicker samples with a thickness of mm range, the 90 degrees stage-configuration is used.

Specifications

  • Four beam sizes are available between 20 and 150 Î¼m defined by Pt or W apertures

  • Bi-directional fly scanning up to 20 ms dwell time

  • Two stage-configurations, 90 and 45 degrees, with respect to the incoming beam

  • Camera for scan setup/sample visualization

  • Samples under ambient air

Flux 

The following fluxes are available with Pt aperture at 10 keV (5th harmonics). A similar flux can be obtained with the W aperture as well.

  • 20 Î¼m: 0.6 x 1011 ph/s/100 mA

  • 50 Î¼m: 3.5 x 1011 ph/s/100 mA

  • 100 Î¼m: 0.9 x 1012 ph/s/100 mA

  • 150 Î¼m: 1.4 x 1012 ph/s/100 mA

image-20260416-193558.png
Distribution of K (green), Cu (blue), and Fe (red) in a Bumblebee.

Setups

The stage configuration can be changed depending on the thickness of the sample.

Stage configuration at 45 degree

image-20260416-200005.png
The macro stage at 45 degrees orientation and the 4E Vortex detector at 90 degrees to the incident beam. This configuration is preferred for thin samples.

Stage configuration at 90 degree

https://bioxas-imaging.lightsource.ca/media/images/macro_stage__90_degre2.width-800.png
The macro stage at 90 degrees orientation and the 4E Vortex detector at 45 degrees to the incident beam. This configuration is preferred for thick samples to avoid shadowing effects in the data caused by the incident beam striking elevated features along its path if the beam is incident at 45°.