BioXAS-Imaging
BioXAS-Imaging

About

Beamline layout 

The source of BioXAS Imaging beamline is an in-vacuum undulator producing a high spectral brilliance. The overall design of the beamline consists of a collimating mirror, a fixed-exit double crystal monochromator (DCM), a post-monochromator focusing mirror and the Kirkpatrick-Baez (KB) mirrors for micro-focusing the beam (micro mode).





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Two insertion devices, undulator and wiggler, in the BioXAS straight.



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Schematic of BioXAS Primary Optics Enclosure.
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Schematic of the setup at the BioXAS Imaging beamline endstation.

Source

  • In-Vacuum Undulator (IVU) (Bruker ASC)

  • Minimum Gap: 5.2 mm

  • Maximum Gap: 40 mm

  • Total Number of Poles: 164

  • Period: 19.1 mm

  • Total Length of Magnet Assemblies: 1600 mm

  • Peak field: 1.011 T

Beam

  • Minimum Energy: 6 keV

  • Maximum Energy: 21 keV

Optics

  • Pre-mono cyllindrical collimating mirror (M1): Si substrate with two reflective coatings (Si and Rh)

  • Post-mono toroidal focusing mirror (M2): Si substrate with Rh coating

  • KB mirrors: Si substrate with Rh coating

Monochromator

  • LN2-cooled constant exit height design (Kohzu)

  • Si(111)

  • Si (220), phi=0 deg

Detectors

  • one 4-element Silicon Drift X-ray detector (Vortex-ME4, SII NanoTechnology)

  • one 3-element Silicon Drift X-ray detector (Vortex-ME3)

  • two single element Silicon Drift X-ray detectors (Vortex-EM, SII NanoTechnology)

Signal processing